ScholarWorks@한양대학교

상세 보기

Effect of the Incorporation of Nitrogen in HfO2 and HfO2 Ny Films Deposited by Remote Plasma Enhanced Atomic Layer Deposition Method

  • 전형탁
제목
Effect of the Incorporation of Nitrogen in HfO2 and HfO2 Ny Films Deposited by Remote Plasma Enhanced Atomic Layer Deposition Method
저자
전형탁
발행일
2005-03-29
학회명
2005 MRS Spring Meeting
개최지
San Francisco

ScholarWorks@한양대학교

(04763) 서울특별시 성동구 왕십리로 222 Tel. +82-2-2220-1370 +82-2-2220-1366

COPYRIGHT © 한양대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.