High throughput and scalable spatial atomic layer deposition of Al2O3 as a moisture barrier for flexible OLED display

Choi, Hagyoung; Shin, Seokyooon; Choi, Yonghyuk; Choi, Yeongtae; Kim, Junghun; Kim, Sanghun; Kim, Hyungkyu; Park, Jongsik; Chung, Seog Chul; Jeon, Hyeong tag; Oh, Kiyoung

doi:10.1002/sdtp.10378

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High throughput and scalable spatial atomic layer deposition of Al2O3 as a moisture barrier for flexible OLED display

Choi, Hagyoung;
Shin, Seokyooon;
Choi, Yonghyuk;
Choi, Yeongtae;
Kim, Junghun;
외 6명

Citations

SCOPUS

6

초록

We have developed high throughput and scalable space divided atomic layer deposition (ALD) system for thin film encapsulation (TFE) of flexible OLEDs display. In this paper, we report high moisture barrier properties of Al2O3 films deposited by our new developed high throughput (70 Å/min) spatial ALD with 2G glass substrate size (370 × 470 mm2). The WVTR on flexible substrate could achieve ∼10-5 g/m2 -day under tritium test.

키워드

ALD; Barrier films; OLED; TFE; WVTR; Alumina; Aluminum oxide; Flexible displays; Moisture; Organic light emitting diodes (OLED); Substrates; Thin films; Barrier films; Flexible substrate; Glass substrates; High throughput; Moisture barriers; OLED; Thin film encapsulation; WVTR; Atomic layer deposition

제목: High throughput and scalable spatial atomic layer deposition of Al2O3 as a moisture barrier for flexible OLED display

저자: Choi, Hagyoung; Shin, Seokyooon; Choi, Yonghyuk; Choi, Yeongtae; Kim, Junghun; Kim, Sanghun; Kim, Hyungkyu; Park, Jongsik ; Chung, Seog Chul ; Jeon, Hyeong tag; Oh, Kiyoung

DOI: 10.1002/sdtp.10378

발행일: 2015-06

유형: Conference Paper

저널명: Digest of Technical Papers - SID International Symposium

권: 46

호: Book 2

페이지: 1043 ~ 1046