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The effects of RF plasma power on Al2O3 films deposited at room-temperature (25C) by remote plasma atomic layer deposition (RPALD)

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The effects of RF plasma power on Al2O3 films deposited at room-temperature (25C) by remote plasma atomic layer deposition (RPALD)
저자
전형탁
발행일
2011-08-24
학회명
Nano Korea 2011
개최지
킨텍스

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