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초록
In this study, a molybdenum disilicide (MoSi2) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO3 powder at 750 degrees C for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3 mu m thick metallic molybdenum thin film was formed at 3 h. MoSi2 was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si : Al(2)0(3) : NH4Cl = 5 : 92 : 3 (wt%) packs at 900 degrees C for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi2 layer was coated successfully and a 15.4 mu m thickness was observed.
키워드
thin films; coating; diffusion; scanning electron microscopy (SEM); hydrogen reduction; CHEMICAL-VAPOR TRANSPORT; MOLYBDENUM; COATINGS; MICROSTRUCTURE; KINETICS; FILMS; OXIDE
- 제목
- 수소 환원 공정과 실리콘 확산 침투 처리 공정을 통한 이규화 몰리브덴 코팅층 형성
- 제목 (타언어)
- Formation of MoSi2 Layer by Hydrogen Reduction and Si-pack Cementation
- 저자
- Jeon, In Mok; Byun, Jong Min; Kim, Se Hoon; Kim, Jin Woo; Kim, Young Do
- 발행일
- 2012-09
- 유형
- Article
- 저널명
- 대한금속·재료학회지
- 권
- 50
- 호
- 9
- 페이지
- 653 ~ 657