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Design of mask grating for obtaining the effect of an offaxis illumination in optical lithography
- Kim, Young-Seok;
- Song, Seok Ho;
- Oh, Sung-Hyun;
- Choi, Yong-Kyu;
- Beom-Hoan O.;
- 외 3명
Citations
SCOPUS
0초록
We proposed the new method for obtaining the effect of an off-axis illumination by using a mask grating formed on the photo mask. The grating structure was designed from the source distribution in the conventional off-axis illumination and the rigorous diffraction theory. Its performance was characterized with simulated Bossung curve.
키워드
Photolithography; Grating structures; Off-axis illumination; Rigorous diffraction theory; Source distribution; Diffraction gratings
- 제목
- Design of mask grating for obtaining the effect of an offaxis illumination in optical lithography
- 저자
- Kim, Young-Seok; Song, Seok Ho; Oh, Sung-Hyun; Choi, Yong-Kyu; Beom-Hoan O.; Park, Se-Geun; Lee, El-Hang; Lee, Seung Gol
- 발행일
- 2007-08
- 유형
- Conference Paper
- 저널명
- Optics InfoBase Conference Papers
- 페이지
- 1 ~ 2