Design of mask grating for obtaining the effect of an off-axis illumination in optical lithography

  • Kim, Young-Seok
  • Song, Seok Ho
  • Oh, Sung Hyun
  • Choi, Yong Kyu
  • O, Beom Hoan
  • 외 3명
Citations

SCOPUS

1

초록

We proposed the new method for obtaining the effect of an off-axis illumination by using a mask grating formed on the photo mask. The grating structure was designed from the source distribution in the conventional off-axis illumination and the rigorous diffraction theory. Its performance was characterized with simulated Bossung curve.

키워드

LithographyElectro-opticsOff-axis-illuminationPacific RimLight
제목
Design of mask grating for obtaining the effect of an off-axis illumination in optical lithography
저자
Kim, Young-SeokSong, Seok HoOh, Sung HyunChoi, Yong KyuO, Beom HoanPark, Se GeunLee, El HangLee, Seung Gol
DOI
10.1109/CLEOPR.2007.4391349
발행일
2007-08
유형
Conference Paper
저널명
Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest
페이지
1 ~ 2