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Analysis of chemical bond states and electrical properties from stack AlON/HfO2 gate oxides formed by a layer-by-layer technique
- 제목
- Analysis of chemical bond states and electrical properties from stack AlON/HfO2 gate oxides formed by a layer-by-layer technique
- 저자
- 남창우
- 발행일
- 2005-12-05
- 학회명
- ICAMD 2005
- 개최지
- 라마다 플라자 제주 호텔