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High-k Based Near n≈1 EUV Mask for M3D Effects and Focus Control in High-NA Lithography
- 제목
- High-k Based Near n≈1 EUV Mask for M3D Effects and Focus Control in High-NA Lithography
- 저자
- 안진호
- 발행일
- 2023-06-06
- 학회명
- 2023 EUVL Workshop & Supplier Showcase
- 개최지
- 벨기에