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High-k binary Mask for Alleviating Fluctuations of Mask Performance based on Focus in High-NA Lithography
- 제목
- High-k binary Mask for Alleviating Fluctuations of Mask Performance based on Focus in High-NA Lithography
- 저자
- 안진호
- 발행일
- 2024-01-18
- 학회명
- 2024 nano convergence conference
- 개최지
- 대전컨벤션센터