Comparative Analysis of n- and p-type Ferroelectric Tunnel Junctions Through Understanding of non-FE Resistance Switching

Comparative Analysis of - and -type Ferroelectric Tunnel Junctions Through Understanding of non-FE Resistance Switching
  • Koo, Ryun-Han; 
  • Shin, Wonjun; 
  • Ryu, Sangwoo; 
  • Lee, Kyungmin; 
  • Park, Sung-Ho; 
  • ... Kwon, Daewoong; 
  • 외 6명
Citations

WEB OF SCIENCE

17
Citations

SCOPUS

16

초록

We re-evaluate the performance of the <italic>p</italic>-type ferroelectric tunnel junction (FTJp) by introducing a perspective that includes non-ferroelectric (FE) resistive switching (RS). Contrary to the previous studies that FTJp exhibits significantly lower on-current density (<italic>J</italic>on) compared to the <italic>n</italic>-type FTJ (FTJn), our observations show that FTJp exhibits comparable <italic>J</italic>on to FTJn, thus achieving a higher tunneling electroresistance (TER) ratio. By analyzing low-frequency noise and temperature dependence of the fatigue rate, we demonstrate that the non-FE RS causes the increase in the <italic>J</italic>on and TER ratio of FTJp. Furthermore, we discover a new advantage of FTJp: It exhibits lower read noise than FTJn in the operating region governed by the FE RS.

키워드

Ferroelectric tunnel junction (FTJ); hafnium zirconium oxide (HfZrO); p-type Si; fatigue mechanisms; ELECTRORESISTANCE; TRANSISTORS; MECHANISMS; CONDUCTION; FILMS
제목
Comparative Analysis of n- and p-type Ferroelectric Tunnel Junctions Through Understanding of non-FE Resistance Switching
제목 (타언어)
Comparative Analysis of - and -type Ferroelectric Tunnel Junctions Through Understanding of non-FE Resistance Switching
저자
Koo, Ryun-Han; Shin, Wonjun; Ryu, Sangwoo; Lee, Kyungmin; Park, Sung-Ho; Im, Jiseong; Ko, Jong-Hyun; Kim, Jeong-Hyun; Kwon, Dongseok; Kim, Jae-Joon; Kwon, Daewoong; Lee, Jong-Ho
DOI
10.1109/LED.2023.3305602
발행일
2023-10
유형
Article
저널명
IEEE Electron Device Letters
권
44
호
10
페이지
1624 ~ 1627