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Interface characteristics with in-situ water vapor treatment of Ge substrate and HfO2 dielectric growth with atomic layer decomposition
- 제목
- Interface characteristics with in-situ water vapor treatment of Ge substrate and HfO2 dielectric growth with atomic layer decomposition
- 저자
- 안진호
- 발행일
- 2010-11-11
- 학회명
- MNC2010(2010 International Microprocesses and Nanotechnology Confeerence)
- 개최지
- Japan