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초록
Thin film transistors (TFTs) utilizing TiInZnO (TIZO) channel layers with different Ti molar ratios were fabricated by using a solution process. X-ray photoelectron spectroscopy spectra for the TIZO film exhibited that the Ti 2p(1/2) peak intensity increased with increasing Ti molar ratio. The addition of the Ti atoms in the TIZO films changed their carrier concentration due to the decrease of O(2-) ions, resulting in a positive shift of the threshold voltage and in a decrease of the off-current. The on/off current ratio of the TFTs with a 10% Ti molar ratio was as large as 0.21 x 10(7).
키워드
carrier density; indium compounds; thin film transistors; titanium compounds; X-ray photoelectron spectra; CHEMICAL-VAPOR-DEPOSITION; AMORPHOUS-SILICON; SEMICONDUCTORS; INSTABILITIES
- 제목
- Effect of the Ti molar ratio on the electrical characteristics of titanium-indium-zinc-oxide thin-film transistors fabricated by using a solution process
- 저자
- Chong, Ho Yong; Han, Kyu Wan; No, Young Soo; Kim, Tae Whan
- 발행일
- 2011-10
- 유형
- Article
- 권
- 99
- 호
- 16
- 페이지
- 1 ~ 3