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Effect of Argon Gas Flow-Rate on Temperature Gradient at the Interface between Si Melt and Solid in Czochralski 450-mm Single Crystal-Silicon Growth

  • 박재근
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Effect of Argon Gas Flow-Rate on Temperature Gradient at the Interface between Si Melt and Solid in Czochralski 450-mm Single Crystal-Silicon Growth
저자
박재근
발행일
2008-05-22
학회명
2008년도 한국재료학회 춘계학술대회 및 제14회 신소재 심포지엄
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