상세 보기
Effect of H2O2 in Alkaline Slurry on Polishing Rate of Crystalline Ge2Sb2Te5 Film in Chemical Mechanical Planarization
- 제목
- Effect of H2O2 in Alkaline Slurry on Polishing Rate of Crystalline Ge2Sb2Te5 Film in Chemical Mechanical Planarization
- 저자
- 백운규
- 발행일
- 2009-11-30
- 학회명
- 2009 MRS Fall Meeting
- 개최지
- Massachusetts, USA