상세 보기
- 제목
- Super-Fine Wet-Cerium-Hydroxide Abrasives for Chemical-Mechanical-Planarization for Scratch-free and High SiO2-film Polishing Rate in Nanoscale Semiconductor Devices
- 저자
- 박재근
- 발행일
- 2021-06-04
- 학회명
- 12th International Symposium for Advanced Functional Materials & Devices
- 개최지
- On-line