Recent review on improving mechanical durability for flexible oxide thin film transistors

  • Han, Ki-Lim
  • Jeong, Hyun-Jun
  • Kim, Beom-Su
  • Lee, Won-Bum
  • Park, Jin-Seong
Citations

WEB OF SCIENCE

13
Citations

SCOPUS

15

초록

Amorphous oxide semiconductor thin film transistors (AOS TFT) have recently attracted attention as next generation display backplane materials. In this article, the current research trends and status of AOS TFTs for flexible displays are discussed. First, the degradation mechanism of AOS TFTs via bending stress is examined. In this part, we investigate how to define bending strain, i.e. how the bending stress deteriorates the TFT performance. In addition, we examine the recovery process of the mechanically degraded TFT via thermal energy. Then, we introduce various materials and structures to improve the mechanical durability of AOS TFTs. The material approach as well as the structural approach for each layer (substrate, buffer layer, electrode, active and gate insulator) are included in this paper.

키워드

amorphous oxide semiconductorthin film transistorflexible displaybending stressmechanical durabilityATOMIC LAYER DEPOSITIONA-IGZO TFTSHIGH-PERFORMANCEHIGH-RESOLUTIONGATE DRIVERTHRESHOLD VOLTAGEBENDING STABILITYTRANSPARENTSTRESSFABRICATION
제목
Recent review on improving mechanical durability for flexible oxide thin film transistors
저자
Han, Ki-LimJeong, Hyun-JunKim, Beom-SuLee, Won-BumPark, Jin-Seong
DOI
10.1088/1361-6463/ab3b6b
발행일
2019-11
유형
Review
저널명
Journal of Physics D: Applied Physics
52
48
페이지
1 ~ 19