A study of the incorporation of conducting materials into direct-patternable SnO2 thin films formed by photochemical metal-organic deposition

초록

Ag nanoparticles and multi-wall carbon nanotubes (MWNTs) were incorporated into a SnO2 photosensitive precursor solution, and a direct-patternable film was prepared by photochemical metal-organic deposition. SnO2 film transmittance and crystallinity were slightly reduced by light absorption of Ag nanoparticles and light scattering by MWNTs. In the case of mixed incorporation of Ag nanoparticles and MWNTs, the sheet resistance of SnO2 hybrid films was decreased relative to incorporation of either single material. Direct-patterning of SnO2 hybrid films was performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated at a low cost, and the electrical properties of SnO2 films can be improved by incorporating Ag nanoparticles with MWNTs.

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