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Characteristics of HfN/HfO2 Gate Stacks Deposited by Remote Plasma Atomic Layer Deposition Method

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Characteristics of HfN/HfO2 Gate Stacks Deposited by Remote Plasma Atomic Layer Deposition Method
저자
전형탁
발행일
2007-04-12
학회명
2007 MRS Spring Meeting
개최지
Moscone West and San Francisco Marriott, San Francisco

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