상세 보기
Effect of Amine Functional Group on Removal Rate Selectivity between Copper and Tantalum-nitride Film in Chemical Mechanical Polishing
- 제목
- Effect of Amine Functional Group on Removal Rate Selectivity between Copper and Tantalum-nitride Film in Chemical Mechanical Polishing
- 저자
- 백운규
- 발행일
- 2008-06-20
- 학회명
- 한국전기전자재료학회 2008 하계학술대회
- 개최지
- 속초 한화리조트