Paper no P35: Improved stability of solution-processed ZnO thin-film transistor post-treated by ultraviolet annealing step

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초록

We present electrical and structural features of solution- processed ZnO thin-film transistors (TFTs) grown via a chemical solution process post-treated by ultra violet (UV) annealing step at processing temperature below 250° C. The transfer curves for the UV annealed ZnO TFTs, including around two-order higher on-current magnitude reveals only a negative drift of -0.66 V in time for 15 days, compared with a -9.29 V negative drift of the conventionally thermally annealed ZnO TFTs at 300°C. The observation of X-ray photoelectron spectroscopy clearly demonstrates the significant reduction of non-lattice oxygen vacancies via proper UV annealing step. The nature of improved stability in the UV-annealed ZnO TFTs is also described.

키워드

AnnealingOxygen vacanciesProcessingSemiconducting organic compoundsThin film circuitsX ray photoelectron spectroscopyZinc oxideChemical solutionsLattice oxygen vacanciesProcessing temperatureSolution-processedStability of solutionsStructural featureTransfer curvesUltraviolet annealingThin film transistors
제목
Paper no P35: Improved stability of solution-processed ZnO thin-film transistor post-treated by ultraviolet annealing step
저자
Kang, TaesungKoo, JayhyunKim, Taeyoon Hong, Jinpyo
DOI
10.1002/sdtp.4
발행일
2013-11
유형
Conference Paper
저널명
Digest of Technical Papers - SID International Symposium
44
페이지
119 ~ 122