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Characterization of Ultra HfO2 Gate Dielectric Prepared by Atomic Layer Deposition
- 제목
- Characterization of Ultra HfO2 Gate Dielectric Prepared by Atomic Layer Deposition
- 저자
- 안진호
- 발행일
- 2001-11-19
- 학회명
- The 3rd International Symposium on Electronic Materials and Packaging 2001