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Self-Assembled NiSi2 Nanocrystals For Nanoscale Non-Volatile Memory Application
초록
We investigated the charge storage capability of self-assembled monolayers of NiSi2 nanocrystals embedded in SiO2 layers. The NiSi2 films with thickness of 3 and 5 nm were sputter deposited on oxidized Si substrates. By subjecting the sputtered NiSi2 thin-film to rapid thermal annealing a monolayer of NiSi2 nanocrystals was formed
- 제목
- Self-Assembled NiSi2 Nanocrystals For Nanoscale Non-Volatile Memory Application
- 저자
- 이승백
- 발행일
- 2007-06-01
- 학회명
- The 51th international conference on electron, ion, and photon beam technology and nanofabrication
- 개최지
- Denver, CO, USA