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Nano-Embossing Ceria Abrasive with Polishing Rate Accelerator for Scratch-Less Poly-Si Stop CMP Application

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Nano-Embossing Ceria Abrasive with Polishing Rate Accelerator for Scratch-Less Poly-Si Stop CMP Application
저자
박재근
발행일
2014-02-26
학회명
제 21회 한국반도체학술대회
개최지
한양대학교

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