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Low-hydrogen SiOxNy Thin Film via Plasma-enhanced Atomic Layer Deposition Using a Hydrogen-free Silicon Precursor and N2 Plasma : Growth Mechanism and Dielectric Properties
- 제목
- Low-hydrogen SiOxNy Thin Film via Plasma-enhanced Atomic Layer Deposition Using a Hydrogen-free Silicon Precursor and N2 Plasma : Growth Mechanism and Dielectric Properties
- 저자
- 박진성
- 발행일
- 2024-01-26
- 학회명
- KCS 2024
- 개최지
- 경주화백컨벤션센터