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Characteristics of Nitrided Hf-Silicate Deposited by Remote Plasma ALD Method

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Characteristics of Nitrided Hf-Silicate Deposited by Remote Plasma ALD Method
저자
전형탁
발행일
2007-06-25
학회명
7th AVS International Conference on Atomic Layer Deposition
개최지
Kona Kai Resort, San Diego, CA, USA

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