Design Techniques for Robust and Area-efficient Current Sources in Nanometer CMOS Technology

Citations

SCOPUS

1

초록

In advanced CMOS technology nodes, stacked short-channel transistors are favored over long-channel transistors for constructing current sources, as they are less constrained by design rules that require additional spacing and transition area for mixing transistors with different channel lengths. In this work, we propose various metrics such as current density (\mathbf{I}{\mathbf{D}}/\mathbf{W}), normalized output impedance (\mathbf{r}{\mathbf{o}}\mathbf{I}{\mathbf{D}}), current normalized to top transistor width (\mathbf{I}{\mathbf{D}}/ \mathbf{W}{\mathbf{top}}), to quantify the performance and resource consumptions of current sources across various device stacks and width ratios. The exploration results reveal that the stacked current source achieve lower area consumption and less parasitic capacitance if the top transistor width is scaled up properly, rather than simply stacking uniform transistors.

키워드

current densitycurrent sourcedeep-submicron CMOS technologyFinFEToutput resistanceCMOS integrated circuitsField effect transistorsIntegrated circuit designMixer circuitsProgrammable logic controllersCurrent sourcesDesign techniqueLong channel transistorsOutput impedanceParasitic capacitanceResource consumptionShort channel transistorsTransistor widthCapacitance
제목
Design Techniques for Robust and Area-efficient Current Sources in Nanometer CMOS Technology
저자
No, TaeungHan, Jaeduk
DOI
10.1109/ISOCC50952.2020.9333000
발행일
2020-10
유형
Conference Paper
저널명
Proceedings - International SoC Design Conference, ISOCC 2020
페이지
232 ~ 233