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High Selectivity (SiO2 : Si3N4 : poly-Si) CMP Slurry Using Highly Negative Charged Nano-Wet Ceria Abrasives

  • 박재근
제목
High Selectivity (SiO2 : Si3N4 : poly-Si) CMP Slurry Using Highly Negative Charged Nano-Wet Ceria Abrasives
저자
박재근
발행일
2016-10-18
학회명
ICPT 2016
개최지
Beijing Friendship Hotel

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