In-Situ Patterning Of Carbon Nanotube Thin-Film Structures By Selective Vacuum Filtration

초록

We report on a method which allows in-situ formation of carbon nanotube device patterns while the carbon nanotube network (CNTn) is being formed. By lithographically patterning a resist layer on the filter membrane, the nanotubes will be guided to the exposed areas of the filter surface during vacuum filtration and the resulting CNTn will conform to the defined resist pattern.