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An Industrial Scale Spatial Atomic Layer Deposition of Al2O3 Films as a Moisture Permation Barrier at Low Temperature (˂100℃)

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An Industrial Scale Spatial Atomic Layer Deposition of Al2O3 Films as a Moisture Permation Barrier at Low Temperature (˂100℃)
저자
전형탁
발행일
2014-06-18
학회명
ALD 2014
개최지
Hotel Granvia Kyoto

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