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A Study on the Characteristics of TiAlN Thin Film Deposited by Atomic Layer Chemical Vapor Deposition Method

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A Study on the Characteristics of TiAlN Thin Film Deposited by Atomic Layer Chemical Vapor Deposition Method
저자
전형탁
발행일
2000-10-02
학회명
47th AVS International Symposium
개최지
Boston, USA

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