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Dependence of Planarization Efficiency on Crystal Characteristic of Abrasives in Nano Ceria Slurry for Shallow Trench Isolation Chemcial Mechanical Polishing

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Dependence of Planarization Efficiency on Crystal Characteristic of Abrasives in Nano Ceria Slurry for Shallow Trench Isolation Chemcial Mechanical Polishing
저자
박재근
발행일
2004-02-19
학회명
Korean Confernce on Semiconductors 11th
개최지
Mujoo Resort, Seoul, Korea

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