ScholarWorks@한양대학교

상세 보기

Atomic Layer Deposition of HfO2/Al2O3 and ZrO2/Al2O3 Films for Gate Dielectric Applications

  • 전형탁
제목
Atomic Layer Deposition of HfO2/Al2O3 and ZrO2/Al2O3 Films for Gate Dielectric Applications
저자
전형탁
발행일
2003-12-02
학회명
2003 MRS Fall Meeting
개최지
Hynes Convention Center and Sheraton Boston HotelBoston,U.S.A

ScholarWorks@한양대학교

(04763) 서울특별시 성동구 왕십리로 222 Tel. +82-2-2220-1370 +82-2-2220-1366

COPYRIGHT © 한양대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.