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A dry development process for vertically tailored hybrid multilayer EUV photoresist: Chemical Vapor Development (CVD)
- 제목
- A dry development process for vertically tailored hybrid multilayer EUV photoresist: Chemical Vapor Development (CVD)
- 저자
- 안진호
- 발행일
- 2024-09-30
- 학회명
- 2024 SPIE Photomask Technology + EUV Lithography
- 개최지
- 미국