Oxide stoichiometry-controlled TaOx-based resistive switching behaviors

  • Baek, Gwang Ho
  • Lee, Ah Rahm
  • Kim, Tae Yoon
  • Im, Hyun Sik
  • Hong, Jin Pyo
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초록

We examine the influence of variable oxygen concentration in TaOx active layers on the forming process and bipolar resistive switching (BRS) features of TaOx-based resistive switching cells. TaOx active layers prepared using various rf sputtering powers were systematically analyzed to identify the relation between initial compositions and BRS behavior. Proper control of oxygen vacancy concentration was clearly identified as a basic factor in ensuring typical BRS features without affecting the structural properties. We describe the possible origins of both conduction and switching based on the variation of oxygen concentrations initially provided by the growth conditions.

키워드

NONVOLATILE MEMORYMEMRISTORSTORAGEDIODESMODELFILMS
제목
Oxide stoichiometry-controlled TaOx-based resistive switching behaviors
저자
Baek, Gwang HoLee, Ah RahmKim, Tae YoonIm, Hyun SikHong, Jin Pyo
DOI
10.1063/1.4963884
발행일
2016-10
유형
Article
저널명
Applied Physics Letters
109
14
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