Analysis of temperature-dependent barrier heights in erbium-silicided Schottky diodes

  • Jun, Myungsim
  • Jang, Moongyu
  • Kim, Yarkeon
  • Choi, Cheljong
  • Kim, Taeyoub
  • 외 2명
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초록

We manufactured erbium-silicided Schottky diodes on n-type and p-type silicon substrates to determine the Schottky barrier heights for electrons and holes, respectively. The effective barrier heights were extracted from the current-voltage-temperature characteristics of the Schottky diodes in reverse-bias condition. The barrier heights were obtained as a function of temperature, decreasing with the decrease of temperature. Low effective barrier heights at low temperature may be due to the trap-assisted current at the erbium silicide/silicon Schottky junction. The temperature-independent barrier heights for electrons and holes were evaluated to be 0.39 and 0.69 eV, respectively, at high temperature by fitting the effective barrier heights as a function of temperature. In this case, the carrier conduction mechanism can be explained by the pure thermionic emission model.

키워드

SILICON INTERFACESINHOMOGENEITIESMECHANISMSTRANSPORTCONTACTSJUNCTION
제목
Analysis of temperature-dependent barrier heights in erbium-silicided Schottky diodes
저자
Jun, MyungsimJang, MoongyuKim, YarkeonChoi, CheljongKim, TaeyoubOh, SoonyoungLee, Seongjae
DOI
10.1116/1.2825172
발행일
2008-01
유형
Article
저널명
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
26
1
페이지
137 ~ 140