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Structural and Electrical characteristics of Low-k Silicon Oxycarbide thin film deposited via Remote Plasma Atomic Layer Deposition

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Structural and Electrical characteristics of Low-k Silicon Oxycarbide thin film deposited via Remote Plasma Atomic Layer Deposition
저자
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발행일
2019-05-17
학회명
2019년도 한국재료학회 춘계학술대회
개최지
평창 알펜시아 리조트

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