High Performance a‐IGZO Thin‐Film Transistors Grown by Atomic Layer Deposition: Cation Combinatorial Approach

  • Min Hoe, Cho
  • Hyunjoo, Seol
  • Nuri, On
  • Tai Kyu, Kim
  • Pil Sang, Yun
  • ... Jeong, Jae Kyeong
  • 외 2명
Citations

SCOPUS

3

초록

We report the effect of the cation composition on the electrical performance of amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs) which was deposited by atomic layer deposition (ALD). The In/In+Ga ratio of a-IGZO TFT was increased, enhancement of the field-effect mobility (µFE) value was observed. The device with a higher In/In+Ga ratio: the In0.45Ga0.15Zn0.40O transistor showed a higher µFE value of 48.3 cm2/Vs, VTH of −4.06 V, SS of 0.45 V/decade, and ION/OFF ratio of > 107. Simultaneously, Density of States (DOSs) profile in a forbidden band gap of the a-IGZO semiconductor were extracted based on the Meyer-Neldel rule (MN rule) to obtain an insight into the cation composition dependent performance of a-IGZO TFTs.

키워드

Indium gallium zinc oxidethin-film transistoratomic layer depositionhigh mobilitydensity of stateAtomic layer depositionAtomsEnergy gapField effect transistorsGallium compoundsII-VI semiconductorsPositive ionsSemiconducting indium compoundsThin film circuitsThin filmsZinc oxideAmorphous-indium gallium zinc oxidesAtomic-layer depositionC. thin film transistor (TFT)Cation compositionCombinatorial approachDensities of stateHigh mobilityOxide thinfilm transistors (TFTs)PerformanceZinc oxide thin filmsThin film transistors
제목
High Performance a‐IGZO Thin‐Film Transistors Grown by Atomic Layer Deposition: Cation Combinatorial Approach
저자
Min Hoe, ChoHyunjoo, SeolNuri, OnTai Kyu, KimPil Sang, YunJong Uk, BaeKwon-Shik, ParkJeong, Jae Kyeong
DOI
10.1002/sdtp.13162
발행일
2019-06
유형
Proceeding
저널명
Digest of Technical Papers - SID International Symposium
50
1
페이지
1259 ~ 1262