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High Performance a‐IGZO Thin‐Film Transistors Grown by Atomic Layer Deposition: Cation Combinatorial Approach
- Min Hoe, Cho;
- Hyunjoo, Seol;
- Nuri, On;
- Tai Kyu, Kim;
- Pil Sang, Yun;
- ... Jeong, Jae Kyeong;
- 외 2명
SCOPUS
3초록
We report the effect of the cation composition on the electrical performance of amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs) which was deposited by atomic layer deposition (ALD). The In/In+Ga ratio of a-IGZO TFT was increased, enhancement of the field-effect mobility (µFE) value was observed. The device with a higher In/In+Ga ratio: the In0.45Ga0.15Zn0.40O transistor showed a higher µFE value of 48.3 cm2/Vs, VTH of −4.06 V, SS of 0.45 V/decade, and ION/OFF ratio of > 107. Simultaneously, Density of States (DOSs) profile in a forbidden band gap of the a-IGZO semiconductor were extracted based on the Meyer-Neldel rule (MN rule) to obtain an insight into the cation composition dependent performance of a-IGZO TFTs.
키워드
- 제목
- High Performance a‐IGZO Thin‐Film Transistors Grown by Atomic Layer Deposition: Cation Combinatorial Approach
- 저자
- Min Hoe, Cho; Hyunjoo, Seol; Nuri, On; Tai Kyu, Kim; Pil Sang, Yun; Jong Uk, Bae; Kwon-Shik, Park; Jeong, Jae Kyeong
- 발행일
- 2019-06
- 유형
- Proceeding
- 권
- 50
- 호
- 1
- 페이지
- 1259 ~ 1262