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Effect of N2, Ar and O2 remote plasma treatments on Surface properties of Si substrate

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제목
Effect of N2, Ar and O2 remote plasma treatments on Surface properties of Si substrate
저자
전형탁
발행일
2010-07-29
학회명
30th International Conference on the Physics of Semiconductors(ICPS2010)
개최지
Coex, Seoul, Korea

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