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Theoretical Investigation of Pattern Printability of Oxidized Si and Ru Capping Model for Extreme Ultraviolet Lithography (EUVL)
- 제목
- Theoretical Investigation of Pattern Printability of Oxidized Si and Ru Capping Model for Extreme Ultraviolet Lithography (EUVL)
- 저자
- 안진호
- 발행일
- 2006-05-10
- 학회명
- IUMRS - ICA - 2006
- 개최지
- Jeju, Korea