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Characteristics of Ruthenium Thin Films Deposited Using Ru(EtCp)2 by Remote Plasma Atomic Layer Deposition

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Characteristics of Ruthenium Thin Films Deposited Using Ru(EtCp)2 by Remote Plasma Atomic Layer Deposition
저자
전형탁
발행일
2009-06-08
학회명
E-MRS 2009 Spring Meeting
개최지
congress center strasbourg, France

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