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Alternative oxidant effects on chemical structure and electrical properties of atomic-layer-deposited La2O3 film on Si using tris(N,N`-diisopropylformamidinato) lanthanum[La(PrfAMD)3]
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- Alternative oxidant effects on chemical structure and electrical properties of atomic-layer-deposited La2O3 film on Si using tris(N,N`-diisopropylformamidinato) lanthanum[La(PrfAMD)3]
- 저자
- 안진호
- 발행일
- 2009-07-20
- 학회명
- ALD 2009(9th international conference on atomic layer deposition)
- 개최지
- USA