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Fabrication and evaluation of Ni-based high-k mask for high numerical aperture extreme ultraviolet lithography
- 제목
- Fabrication and evaluation of Ni-based high-k mask for high numerical aperture extreme ultraviolet lithography
- 저자
- 안진호
- 발행일
- 2021-01-19
- 학회명
- 2021 nano convergence conference
- 개최지
- 곤지암리조트