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Characteristics of HfO2 Thin Film deposited on Ultrathin SiO2 by Remote Plasma Atomic Layer Deposition Method

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Characteristics of HfO2 Thin Film deposited on Ultrathin SiO2 by Remote Plasma Atomic Layer Deposition Method
저자
전형탁
발행일
2006-09-11
학회명
IUMRS International Conference in Asia 2006 (IUMRS-ICA-2006) meeting
개최지
Hotel Shilla, Jeju

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