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초록
The defect states of an electron-beam irradiated GaN epilayer were characterized by capacitance-voltage (C-V) and deep-level transient spectroscopy (DLTS) measurements. The electron irradiation was performed using 1 and 2 MeV energy beams with 1 x 10(15) and 1 x 10(16) cm(-2) doses, respectively. The depth penetrated in the GaN epilayer by I MeV electrons appeared to be about 450 to 600 nm from the C-V measurement. Five defect states with activation energies of 0.34, 0.49, and 0.65 eV including two broad signals were observed by DLTS measurements, and it was suggested that they might originate from crystal damage during high-energy electron irradiation.
키워드
electron-beam irradiation; DLTS; GaN epilayer; defect; Activation energy; Atoms; Deep level transient spectroscopy; Defects; Electrons; Epilayers; Epitaxial growth; Gallium alloys; Gallium nitride; High energy physics; Irradiation; Semiconducting gallium
- 제목
- Study on Defect States in GaN Epilayer Induced by Irradiation of High-Energy Electrons
- 저자
- Ha, Limkyung; Lee, Dong Uk; Kim, Jin Soak; Kim, Eun Kyu; Lee, Byung Cheol; Oh, Dae Kon; Bae, Sung-Bum; Lee, Kyu-Seok
- 발행일
- 2008-08
- 유형
- Article; Proceedings Paper
- 권
- 47
- 호
- 8
- 페이지
- 6867 ~ 6869