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Design of pattern-specific mask grating for giving the effect of an off-axis illumination
- Kim, Young-Seok;
- Song, Seok Ho;
- Lee, Jong Ung;
- Oh, Sung Hyun;
- Choi, Yong Kyoo;
- 외 5명
Citations
SCOPUS
1초록
In order to realize the effect of pattern-specific off-axis illumination under the conventional circular illumination, the illumination method using a mask grating formed on the top side of a photo mask was evaluated and improved. Contrary to an off-axis illumination, it could provide the locally different off-axis illumination depending on the pattern shape defined on the bottom side of a mask. The structure of the mask grating was determined from the feature characteristics of the mask pattern and its performance was evaluated with the simulated Bossung curves.
키워드
Dummy mask; Mask grating; Off-axis illumination; Optical lithography; Resolution enhancement; Architectural design; Masks; European; In order; mask patterning; Off-axis-illumination (OAI); Pattern shape; photo masking; Photoacoustic effect
- 제목
- Design of pattern-specific mask grating for giving the effect of an off-axis illumination
- 저자
- Kim, Young-Seok; Song, Seok Ho; Lee, Jong Ung; Oh, Sung Hyun; Choi, Yong Kyoo; Kim, Munsik; Rajiv, Beom-Hoan; Park, Se-Geun; Lee, El-Hang; Lee, Seung Gol
- 발행일
- 2008-05
- 유형
- Conference Paper
- 저널명
- Proceedings of SPIE - The International Society for Optical Engineering
- 권
- 6792
- 페이지
- 1 ~ 10
- 언어
- ENG
- 출판사
- SPIE
- 발행국가
- 미국
- 분량
- 10 페이지
- ISSN
- P 0277-786X