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Characteristics of Atomic Layer Deposition SnO2 films using TDMASn precursor and various oxygen reactants
- 제목
- Characteristics of Atomic Layer Deposition SnO2 films using TDMASn precursor and various oxygen reactants
- 저자
- 박진성
- 발행일
- 2013-10-09
- 학회명
- TACT 2013 (Taiwan Association for Coating and Thin Films Technology)
- 개최지
- The Grand hotel, Taipei, Taiwan