촉매 화학기상증착 공정에서 온도구배 설정을 통한 타이타늄 기판에서의 CNT 성장 거동

CNT Growth Behavior on Ti Substrate by Catalytic CVD Process with Temperature Gradient in Tube Furnace
  • 박주혁
  • 변종민
  • 김형수
  • 석명진
  • 오승탁
  • 외 1명

초록

In this study, modified catalytic chemical vapor deposition (CCVD) method was applied to control theCNTs (carbon nanotubes) growth. Since titanium (Ti) substrate and iron (Fe) catalysts react one another and form a newphase (Fe2TiO5) above 700oC, the decrease of CNT yield above 800oC where methane gas decomposes is inevitableunder common CCVD method. Therefore, we synthesized CNTs on the Ti substrate by dividing the tube furnace intotwo sections (left and right) and heating them to different temperatures each. The reactant gas flew through from theend of the right tube furnace while the Ti substrate was placed in the center of the left tube furnace. When the CNTgrowth temperature was set 700/950oC (left/right), CNTs with high yield were observed. Also, by examining the microstructureof CNTs of 700/950oC, it was confirmed that CNTs show the bamboo-like structure.

키워드

Catalytic chemical vapor depositionFe catalystTitanium substratemethane gasCNTs
제목
촉매 화학기상증착 공정에서 온도구배 설정을 통한 타이타늄 기판에서의 CNT 성장 거동
제목 (타언어)
CNT Growth Behavior on Ti Substrate by Catalytic CVD Process with Temperature Gradient in Tube Furnace
저자
박주혁변종민김형수석명진오승탁김영도
DOI
10.4150/KPMI.2014.21.5.371
발행일
2014-10
저널명
한국분말야금학회지
21
5
페이지
371 ~ 376