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Atomic Layer Deposition of HfO2/Al2O3 Laminate Structure for Gate Dielectric Applications

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Atomic Layer Deposition of HfO2/Al2O3 Laminate Structure for Gate Dielectric Applications
저자
전형탁
발행일
2002-11-05
학회명
49th AVS International Symposium
개최지
Colorado Convention Center Denver, Colorado

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