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Optimization of Absorber stack of EUVL mask in optical and etch properties
- 제목
- Optimization of Absorber stack of EUVL mask in optical and etch properties
- 저자
- 안진호
- 발행일
- 2005-11-07
- 학회명
- 4th International Extreme Ultraviolet Lithography Symposium
- 개최지
- San Diego, USA