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The study of graytone mask structure for manufacturing thin film transistor
- Kang, H.J.;
- Cha, Han-sun;
- Ahn, Jinho;
- Ryu, H;
- Kim, SW;
- 외 1명
Citations
SCOPUS
0초록
We researched three types of GTM structures for reduction technology of TFT-LCD manufacturing process. Through the simulation results, we confirmed that the slit TM mask structure was superior, which has good Gaussian and smooth curve in the graytone area of residual photoresist. Also this slit TM mask has controllability of phase shift and transmittance by controlling the TM layer. But more researches for slit TM mask are still needed and investigation for TM mask blanks and photomask must be done additionally.
키워드
Industrial engineering; Nanotechnology; Photomasks; Photoresists; Thick films; Thin film devices; Thin film transistors; Gaussian; International (CO); Mask blanks; Micro-processes; Photo masking; Reduction technologies; Simulation results; TFT-LCD manufacturing; Storage allocation (computer)
- 제목
- The study of graytone mask structure for manufacturing thin film transistor
- 저자
- Kang, H.J.; Cha, Han-sun; Ahn, Jinho; Ryu, H; Kim, SW; Nam, Keesoo
- 발행일
- 2007-11
- 유형
- Conference Paper
- 저널명
- Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
- 페이지
- 58 ~ 59